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20080903090000.0 |
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080530 nyu |
| 020 |
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|a 3540539549 (pbk)
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| 035 |
0 |
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|a NM
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| 040 |
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|a NM
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| 090 |
0 |
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|a TK7872
|b .L63 1991
|
| 245 |
0 |
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|a LPCVD silicon nitride and oxynitride films :
|b material and applications in intergrated circuit technology
|c F. H. P. M. Habraken, editor.
|
| 260 |
0 |
0 |
|a Berlin:
|b Springer-Verlag,
|c 1991.
|
| 300 |
0 |
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|a x, 159p.:
|b ill.;
|c 24cm.
|
| 440 |
0 |
0 |
|a Research reports ESPRIT. Project 369;
|v vol. 1
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| 500 |
0 |
0 |
|a Includes bibliographical references
|
| 650 |
0 |
0 |
|a Thin film devices
|
| 650 |
0 |
0 |
|a Silicon nitride
|
| 650 |
0 |
0 |
|a Integrated circuits --
|x Very large scale integration --
|x Materials
|
| 650 |
0 |
0 |
|a Metal oxide semiconductor, Complementary
|
| 700 |
1 |
1 |
|a Habraken, F. H. P. M.
|
| 852 |
|
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|a NM
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| 999 |
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|a 0000010071
|b Book
|c Open Shelf
|e HQ Library
|
