00958cam a2200265 7i4500 0000005366 20080903090000.0 20040419 12:41 080530 nyu 3540539549 (pbk) NM NM TK7872 .L63 1991 LPCVD silicon nitride and oxynitride films : material and applications in intergrated circuit technology F. H. P. M. Habraken, editor. Berlin: Springer-Verlag, 1991. x, 159p.: ill.; 24cm. Research reports ESPRIT. Project 369; vol. 1 Includes bibliographical references Thin film devices Silicon nitride Integrated circuits -- Very large scale integration -- Materials Metal oxide semiconductor, Complementary Habraken, F. H. P. M. NM 0000010071 Book Open Shelf HQ Library