Cover Image

Principles of plasma discharges and material processing

Main Author: Lieberman
Other Authors: Lichtenberg,
Published: New York: John Wiley & Sons, 1994.
Subjects:
Plasma chemistry -- > Industrial applications
Plasma dynamics
Thin films -- > Surfaces
Plasma etching

HQ Library

Call Number: QC718 5 D9 L54 1994
Accession Item Category Format Status Notes
0000010927 Open Shelf Book AVAILABLE

Similar Items