Deposition and growth : limits for microelectronics, Anaheim, CA, 1978

Corporate Author: American Institute of Physics
Other Authors: Rubloff,
Language:English
Published: New York: American Institute of Physics, 1988.
Series:American Vacuum Society series; 4
American Institute of Physics conference proceedings; no.167
Subjects:
Physical Description:388p.: ill.; 25 cm.
Bibliography:Includes bibliographies and index
ISBN:0883183676