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LPCVD silicon nitride and oxynitride films : material and applications in intergrated circuit technology

Other Authors: Habraken, F. H. P. M.
Published: Berlin: Springer-Verlag, 1991.
Series:Research reports ESPRIT. Project 369; vol. 1
Subjects:
Thin film devices
Silicon nitride
Integrated circuits -- > Very large scale integration -- > Materials
Metal oxide semiconductor, Complementary
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