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LPCVD silicon nitride and oxynitride films : material and applications in intergrated circuit technology

Other Authors:	Habraken, F. H. P. M.
Published:	Berlin: Springer-Verlag, 1991.
Series:	Research reports ESPRIT. Project 369; vol. 1
Subjects:	Thin film devices Silicon nitride Integrated circuits -- > Very large scale integration -- > Materials Metal oxide semiconductor, Complementary

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